Thin films: deposition, growth, characterization
Un article de Surface du verre et interfaces.
Sergey Grachev - Elin Sondergard - Anne Lelarge
Thin films and multilayers are widely used to improve resistances of a surface and to add functional properties to the product. In case of glass, these are optical, electrical and other properties (see Surface functionalization and nanostructures). We utilise sputter-deposition technique (also used in Saint-Gobain) in order to create the multilayers.
MISSTIC (Multilayers and Interfaces Sputter-deposited on STructured substrates and In-situ Characterization) is a sputter-deposition setup which allows deposition from three magnetrons (also simultaneously), the movement of the substrate during deposition (translational and rotational) and in-situ characterisation by UV reflectometry and substrate bending monitoring. It is coupled to a load lock and (via load-lock) to a characterisation chamber with an X-ray and UV photoelectron spectrometer (XPS and UPS) and a low-energy electron diffraction setup (LEED).
This setup is used in a number of projects. Here are a few of them:
Silver_growth_studied_by_UV_reflectometry
See also Projects.
